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Facilities and Equipment
Laser and Coherence Sources
Clark MXR CPA 2001 femtosecond Ti:sapphire amplifier with
Light Conversion TOPAS optical parametric generator
Supercontinuum sources
Picosecond/Nanosecond Nd lasers
High resolution tunable dye laser and Ti:sapphire lasers
Photonic Materials Production
Glass chemistry laboratory for chalcogenide glasses (rocking and tube furnaces)
TEPLA plasma cleaner
Czochralski crystal growth facility
Thin Film Deposition and Photonic Device Fabrication
Thin film deposition:
Lithography facilities:
Coating system
Access to customized Orsay Physics Focused Ion Beam Mill for nano-patterning
Characterisation
Spectrophotometers
Z-scan setup for determining the third order optical nonlinearity
Raman spectrometer
Optical Microscope with High Resolution Digital Camera
Clean Room Area.
SCI filmtek to characterise thin film
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Dr Steve Madden working with coating track
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